Installed in early June, the RAITH E-Line Plus is an Ultra high resolution, Electron Beam Lithography instrument. It provides the essential tools required for Nano Fabrication processes and techniques at The University of Queensland. It caters to a variety of different applications:  SEM imaging and analysis; Nano lithography; Nano manipulation and Focused Electron Beam Induced additive fabrication by material deposition and subtractive fabrication by etching.  At 1keV using the 30mm aperture the beam size can reach 3.4nm.  A 1.5nm beam size can be achieved at 20keV.  The E-Line Plus is a specialised tool with high resolution capabilities; able to expose features that are less than 10nm in size. 



Location: AIBN

Contact: Eunice Grinan on

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