RAITH e-Line Plus Electron Beam Lithography SEM
A multi-purpose, high resolution, E-beam writer hosted in a class 10,000 cleanroom with 100 mm full writing capability. This system also caters a variety of different applications from nanolithography, to high resolution large area imaging, material deposition and etching. The minimum beam size is 1.5 nA and 3.4 nA at 20 kV and 1 kV of acceleration voltage.
Location: Hawken Building #50 (Cleanroom L116)
Contact: Elliot Cheng h.cheng6@uq.edu.au
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Example publications from this instrument
Further information see news article Raith E-Line Plus