The Evactron 25 De-Contaminator RF Plasma Cleaning System uses a “downstream” cleaning process to gently remove hydrocarbon contamination from surfaces. A compact low energy Plasma Radical Source (PRS) mounted on the side of a vacuum chamber creates a localized plasma from air which cleans surfaces by chemical reaction. This “chemical etch” process is different to high powered and more traditional “direct” plasma cleaners that expose surfaces directly to bombardment with energetic ions in order to vigorously etch or ablate the contaminated surface. 

Location: Hawken Building #50 (Room L113)

Contact: Ron Rasch:

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