Dr Elliot Cheng obtained his PhD from the MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Electronic Engineering, University of Canterbury (New Zealand) in 2009. During 2009–2012, he worked at The University of Queensland as a postdoctoral researcher on a collaborative project between a team of researchers from UQ and Intel Corp., Hillsboro, USA, on developing directed-self-assembly (DSA) processes for extreme ultraviolet lithography (EUVL) for 22 nm transistor fabrication. Elliot specialises in electron beam lithography (EBL) and next generation lithography for transistor manufacture. Elliot has a vast knowledge of nano and microfabrication and characterisation techniques such as UV lithography, two-photon lithography, focused ion beam lithography, electron and scanning probe microscopy.

ORCID ID: orcid.org/0000-0002-4663-5111
https://espace.library.uq.edu.au/uqhche13 (UQ espace)
https://www.researchgate.net/profile/Han_Hao_Cheng (Publication)