High performance coater and hot plate modules hosted in the wet area in the cleanroom for preparation of photoresist coatings. The CEE Apogee systems can be used on wafers up to 200 mm in diameter. The precision hot plate module delivers ± 0.1C of temperature variations over the entire surface. Please consult with CMM for type of resist allowed in the systems.


Location: Hawken Building #50 (Cleanroom L115)

Contact: Elliot Cheng h.cheng6@uq.edu.au

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